Room temperature chemical deposition of amorphous TiO2 thin films from Ti(III) chloride solution

被引：41

作者：

Lokhande, CD ^{[1
]}

Lee, EH ^{[1
]}

Jung, KD ^{[1
]}

Joo, OS ^{[1
]}

机构：

[1] Korea Inst Sci & Technol, Econano Res Ctr, Seoul 130650, South Korea

来源：

JOURNAL OF MATERIALS SCIENCE | 2004年 / 39卷 / 08期

关键词：

D O I：

10.1023/B:JMSC.0000021480.40562.09

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Chemical deposition of TiO2 thin films at room temperature was carried out from titanium(III) chloride, TiCl3 solution. As received TiCl3 solution was taken into the beaker and its pH was adjusted between 2-5 using 7% NaHCO3 solutions with constant stirring. Deposition of TiO2 films was carried out onto previously cleaned ITO coated glass substrates. The TiO2 films were heat treated in air at 723 K for 1-12 h. The results show that the TiO2 films obtained are porous and exhibit photoactivity.

引用

页码：2915 / 2918

页数：4

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