The nucleation and growth kinetics of fullerene crystals in thin films of a polymer: fullerene bulk-heterojunction blend are investigated. We find that both processes are strongly diffusion-limited at 100-110 degrees C due to the proximity to the glass transition temperatures of the blend components. Whereas the growth rate exponentially increases with temperature up to 230 degrees C, the nucleation rate displays a broad maximum around 150-170 degrees C, which coincides with the highest rate of fullerene crystallisation. A time-temperature-transformation (TTT) diagram reveals that across the investigated range of temperatures the low rate of nucleation is responsible for the formation of micrometre-sized crystals, which can be detrimental for polymer solar cells. Thus, we identify the lack of sufficient nucleation, which predominantly occurs on the substrate interface, as the origin of this important degradation mechanism.
机构:Carl von Ossietzky Univ Oldenburg, Dept Phys, Energy & Semicond Res Lab, D-26111 Oldenburg, Germany
Chirvase, D
;
Parisi, J
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机构:Carl von Ossietzky Univ Oldenburg, Dept Phys, Energy & Semicond Res Lab, D-26111 Oldenburg, Germany
Parisi, J
;
Hummelen, JC
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机构:Carl von Ossietzky Univ Oldenburg, Dept Phys, Energy & Semicond Res Lab, D-26111 Oldenburg, Germany
Hummelen, JC
;
Dyakonov, V
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Carl von Ossietzky Univ Oldenburg, Dept Phys, Energy & Semicond Res Lab, D-26111 Oldenburg, GermanyCarl von Ossietzky Univ Oldenburg, Dept Phys, Energy & Semicond Res Lab, D-26111 Oldenburg, Germany
机构:
Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
He, Christine
;
Germack, David S.
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Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Germack, David S.
;
Kline, R. Joseph
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Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Kline, R. Joseph
;
Delongchamp, Dean M.
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Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Delongchamp, Dean M.
;
Fischer, Daniel A.
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Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Fischer, Daniel A.
;
Snyder, Chad R.
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Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Snyder, Chad R.
;
Toney, Michael F.
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Stanford Synchrotron Radiat Lightsource, Menlo Pk, CA 94025 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Toney, Michael F.
;
Kushmerick, James G.
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Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Kushmerick, James G.
;
Richter, Lee J.
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Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
机构:Carl von Ossietzky Univ Oldenburg, Dept Phys, Energy & Semicond Res Lab, D-26111 Oldenburg, Germany
Chirvase, D
;
Parisi, J
论文数: 0引用数: 0
h-index: 0
机构:Carl von Ossietzky Univ Oldenburg, Dept Phys, Energy & Semicond Res Lab, D-26111 Oldenburg, Germany
Parisi, J
;
Hummelen, JC
论文数: 0引用数: 0
h-index: 0
机构:Carl von Ossietzky Univ Oldenburg, Dept Phys, Energy & Semicond Res Lab, D-26111 Oldenburg, Germany
Hummelen, JC
;
Dyakonov, V
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h-index: 0
机构:
Carl von Ossietzky Univ Oldenburg, Dept Phys, Energy & Semicond Res Lab, D-26111 Oldenburg, GermanyCarl von Ossietzky Univ Oldenburg, Dept Phys, Energy & Semicond Res Lab, D-26111 Oldenburg, Germany
机构:
Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
He, Christine
;
Germack, David S.
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Germack, David S.
;
Kline, R. Joseph
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Kline, R. Joseph
;
Delongchamp, Dean M.
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Delongchamp, Dean M.
;
Fischer, Daniel A.
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Fischer, Daniel A.
;
Snyder, Chad R.
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Snyder, Chad R.
;
Toney, Michael F.
论文数: 0引用数: 0
h-index: 0
机构:
Stanford Synchrotron Radiat Lightsource, Menlo Pk, CA 94025 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Toney, Michael F.
;
Kushmerick, James G.
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA
Kushmerick, James G.
;
Richter, Lee J.
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Mat Measurement Lab, Gaithersburg, MD 20899 USA