Stability of the passive state of Al-Ta and Al-Nb amorphous alloys

被引：9

作者：

Janik-Czachor, M

Jaskiewicz, A

Kedzierzawski, P

Werner, Z

机构：

[1] Polish Acad Sci, Inst Phys Chem, PL-01224 Warsaw, Poland

[2] Warsaw Inst Technol, Dept Mat Sci, Warsaw, Poland

[3] Soltan Inst Nucl Problems, Otwock, Poland

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2003年 / 358卷 / 1-2期

关键词：

amorphous alloys; Al-based alloys; passivity; passivity breakdown; pitting; pit nucleation potential;

D O I：

10.1016/S0921-5093(03)00332-0

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 [材料科学与工程]; 080502 [材料学];

摘要：

The effect of Cl- ions (0-1 M NaCl) on the anodic behavior of two series of sputter-deposited Al-Ta (11-46 at.%) and Al-Nb (13-46 at.%) amorphous alloys (AAs) was investigated in neutral electrolytes by using electrochemical and in situ microscopic methods. The samples were characterized by Auger electron spectrometry; a thin alumina film was found to cover the surface of the substrate, whereas transition metal was not detected therein. In solutions containing Cl-, the alloys broke down at and above the pit nucleation potential E-np. The alloys exhibited a stable passivity within a much wider (DeltaE > 1 V) potential range than crystalline Al. In situ microscopic investigations revealed that for Al-Ta and Al-Nb AAs, the local current density within the pits was similar to 10(6) higher than the current density from the remaining passive surface. The results are compared with those for Al-Mo and Al-W alloys and the mechanism of restrained passivity break down is discussed. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：171 / 177

页数：7

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