Effects of post-annealing temperatures and ambient atmospheres on the electrical properties of ultrathin (Ba,Sr)TiO3 capacitors

被引:18
作者
Chen, PC [1 ]
Miki, H [1 ]
Shimamoto, Y [1 ]
Matsui, Y [1 ]
Hiratani, M [1 ]
Fujisaki, Y [1 ]
机构
[1] Hitachi Ltd, Cent Res Lab, Kokubunji, Tokyo 185, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 9B期
关键词
(Ba; Sr)TiO3; post-annealing; LSI; platinum; capacitor; leakage current;
D O I
10.1143/JJAP.37.5112
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ultrathin (Ba,Sr)TiO3 (BST) film capacitors with a Pt/Ba0.5Sr0.5TiO3(30 nm)/Pt/TiN/Si structure were fabricated. To investigate the effects of annealing temperatures, capacitors were annealed in Bowing Ar or O-2 at temperatures ranging from 400 degrees C to 600 degrees C for 30 min. The electrical properties of the annealed samples were strongly dependent on the annealing temperatures. In the capacitors annealed at 500 degrees C (in Ar and O-2) and 550 degrees C (in O-2), the leakage current decreased to a level of 10(-8) A/cm(2) when the bias voltage was +/-1.5 V. In the as-deposited sample, the maximum capacitance appeared at a bias voltage of -1 V. However, the maximum capacitance increased and appeared at the zero bias voltage after annealing. These phenomena are believed to be defect-related (due to oxygen vacancies). The annealing atmospheres were also found to have an effect on preserving the morphology of the Pt electrodes.
引用
收藏
页码:5112 / 5117
页数:6
相关论文
共 20 条
[1]   Domain switching and spatial dependence of permittivity in ferroelectric thin films [J].
Chai, FK ;
Brews, JR ;
Schrimpf, RD ;
Birnie, DP .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (05) :2505-2516
[2]  
CHEN X, 1993, INTEGR FERROELECTR, V3, P259
[3]  
Cheol Seong Hwang, 1996, Integrated Ferroelectrics, V13, P157, DOI 10.1080/10584589608013090
[4]   ELECTRODE INFLUENCE ON THE CHARGE-TRANSPORT THROUGH SRTIO3 THIN-FILMS [J].
DIETZ, GW ;
ANTPOHLER, W ;
KLEE, M ;
WASER, R .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (10) :6113-6121
[5]   The effects of the catalytic nature of capacitor electrodes on the degradation of ferroelectric Pb(Zr,Ti)O-3 thin films during reductive ambient annealing [J].
Fujisaki, Y ;
KushidaAbdelghafar, K ;
Shimamoto, Y ;
Miki, H .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (01) :341-344
[6]   Influence of temperature and interface charge on the grain-boundary conductivity in acceptor-doped SrTiO3 ceramics [J].
Hagenbeck, R ;
Waser, R .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (04) :2083-2092
[7]   CURRENT-VOLTAGE CHARACTERISTICS OF ULTRAFINE-GRAINED FERROELECTRIC PB(ZR, TI)O3 THIN-FILMS [J].
HU, H ;
KRUPANIDHI, SB .
JOURNAL OF MATERIALS RESEARCH, 1994, 9 (06) :1484-1498
[8]  
HWANG CS, 1995, JPN J APPL PHYS, V34, P157
[9]   STRUCTURAL AND ELECTRICAL CHARACTERISTICS OF SRTIO3 THIN-FILMS FOR DYNAMIC RANDOM-ACCESS MEMORY APPLICATIONS [J].
JOSHI, PC ;
KRUPANIDHI, SB .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (11) :7627-7634
[10]   Novel ferroelectric epitaxial (Ba,Sr)TiO3 capacitor for deep sub-micron memory applications [J].
Kawakubo, T ;
Abe, K ;
Komatsu, S ;
Sano, K ;
Yanase, N ;
Mochizuki, H .
IEEE ELECTRON DEVICE LETTERS, 1997, 18 (11) :529-531