Growth of carbon nanotubes at temperatures compatible with integrated circuit technologies

被引:37
作者
Chen, Guan Yow
Jensen, Ben
Stolojan, Vlad [1 ]
Silva, S. R. P. [1 ]
机构
[1] Univ Surrey, Fac Elect & Phys Sci, Adv Technol Inst, Nano Elect Ctr, Surrey GU2 7XH, England
基金
英国工程与自然科学研究理事会;
关键词
SPECTROSCOPY; NANOFIBRES; DEPOSITION;
D O I
10.1016/j.carbon.2010.09.021
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070305 [高分子化学与物理];
摘要
The potential applications of carbon nanotubes grown for semiconductor and sensor devices are immense But, this growth must be CMOS compatible and over large-areas, in excess of 4 inches in diameter, for any industrial interest Reports of low-temperature growth of carbon nanotubes have mostly resulted in false dawns in the context of CMOS production, with direct integration for mass manufacturing remaining a challenge, as lower synthesis temperatures matched to manufacturing result in nanotubes with high defect levels We report a unique 'top-down' synthesis method that allows energy delivery directly to the catalyst, resulting in higher quality nanotube growth at compatible low sub strate temperatures This growth is demonstrated over a large-area, whilst maintaining the silicon substrate below 350 degrees C Long-range ordering of carbon nanotubes is supported by well developed second order Raman peaks and HREM The methodology developed is suitable to produce many nano-material systems, including graphene and silicon nanowires (C) 2010 Elsevier Ltd All rights reserved
引用
收藏
页码:280 / 285
页数:6
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