XPS and AFM characterization of a vanadium oxide film on TiO2(100) surface

被引：37

作者：

Chiarello, G ^{[1
]}

Barberi, R ^{[1
]}

Amoddeo, A ^{[1
]}

Caputi, LS ^{[1
]}

Colavita, E ^{[1
]}

机构：

[1] UNIV CALABRIA,DIPARTIMENTO FIS,I-87036 RENDE,COSENZA,ITALY

来源：

APPLIED SURFACE SCIENCE | 1996年 / 99卷 / 01期

关键词：

D O I：

10.1016/0169-4332(95)00451-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Vanadium oxide has been grown in ultra high vacuum onto a rutile TiO2(100) surface and studied by X-ray photoelectron spectroscopy and atomic force microscopy. The AFM image showed a surface with a peculiar roughness made of three-dimensional structures having an average height of 10 nm and an average base radius of about 100 nm.

引用

页码：15 / 19

页数：5

共 23 条

[1]

[Anonymous], 1975, PHASE DIAGRAMS CER S

[2]

BARBERI R, IN PRESS

[3] STRUCTURE AND REACTIVITY OF TITANIA-SUPPORTED OXIDES .2. CHARACTERIZATION OF VARIOUS VANADIUM-OXIDE ON TITANIA CATALYSTS BY X-RAY PHOTOELECTRON-SPECTROSCOPY [J].