Progress in epitaxial deposition on low-cost substrates for thin-film crystalline silicon solar cells at IMEC

被引:15
作者
Van Nieuwenhuysen, K [1 ]
Duerinckx, F [1 ]
Kuzma, I [1 ]
van Gestel, D [1 ]
Beaucarne, G [1 ]
Poortmans, J [1 ]
机构
[1] IMEC vzw, B-3001 Louvain, Belgium
关键词
defects; chemical vapor deposition processes; solar cells;
D O I
10.1016/j.jcrysgro.2005.11.060
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In recent years, research on epitaxial growth for photovoltaics became more important due to the increasing interest in thin-film silicon solar cells. Two significant challenges need to be resolved before this technique can become a competitive industrial alternative to the current dominating technology of bulk silicon solar cells: (i) the availability of a high-throughput and cost-effective epitaxial CVD reactor and (ii) efficiencies approaching those of bulk Si solar cells. In this paper, two CVD systems are studied: an AP-CVD commercial reactor, as a reference system, and an experimental LP-CVD system for optimization of a low-cost semi-industrial process. For low growth rates, an LP-CVD process is realized with a defect density around 5 x 10(3) defects/cm(2), comparable with the layers grown in the commercial reactor with a growth rate of 3.9 mu m/min. First solar cells, grown in the LP-CVD reactor show an efficiency of 8.2% on mono-crystalline samples. Cells on various low-cost substrates, grown in the reference reactor, show efficiencies between 12% and 13% with IMEC's industrial screen-printing process. The short-circuit current of epitaxial cells is limited to 28 mA/cm(2) (typically 5 mA/cm(2) less than for bulk Si cells). Therefore, the thin epitaxial cell concept requires optimal light trapping, increasing the optical path length. Experiments show that a porous silicon (PS), giving an internal reflectance up to 80%. However, the intermediate layer as an internal reflector can fulfill this role adequately. effectiveness of this reflector depends on its influence on the quality of the epi-layer. Measurements show a lower-quality epi-layer for samples with a PS intermediate layer, but indicate that further optimization of the pre-deposition bake could lead to a compromise between current gain by internal reflectance and losses caused by the increased defect density. (c) 2005 Published by Elsevier B.V.
引用
收藏
页码:438 / 441
页数:4
相关论文
共 10 条
[1]  
DUERINCKX F, 2005, IN PRESS PROG PHOTOV
[2]  
DUERINCKX F, 2005, IN PRESS 29 EPVSEC B
[3]  
HURRLE A, 2005, 19 IPVSEC PAR FRANC, P459
[4]  
Müller G, 2000, PHYS STATUS SOLIDI A, V182, P313, DOI 10.1002/1521-396X(200011)182:1<313::AID-PSSA313>3.0.CO
[5]  
2-B
[6]   Study of Si deposition in a batch-type LPCVD-system for industrial thin-film crystalline Si solar cells [J].
Poortmans, J ;
Beaucarne, G ;
Sivoththaman, S .
CONFERENCE RECORD OF THE TWENTY-EIGHTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 2000, 2000, :347-350
[7]  
RODRIGUEZ HJ, 2005, 19 EPVSEC PAR FRANC, P903
[8]  
SOLANKI CS, 2004, THESIS KU LEUVEN, P15
[9]  
VANNIEUWENHUYSE.K, 2000, 19 EPVSEC PAR FRANC, P1178
[10]  
VANNIEUWENHUYSE.K, 2005, IN PRESS 20 EPVSEC B