Two magnetic phases in the co-sputtered Fe-Si3N4 thin film

被引:1
作者
Han, SM
Yu, SC
Kim, WT
Han, SH
Kim, HJ
机构
[1] CHONGJU UNIV, DEPT PHYS, CHONJU 360764, SOUTH KOREA
[2] KOREA INST SCI & TECHNOL, DIV MET, SEOUL 130650, SOUTH KOREA
关键词
D O I
10.1109/20.619513
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The structure and magnetic properties of Fe-Si3N4 thin films fabricated by a co-sputtering technique mere studied by X-ray diffractometry and magnetometry. With increasing area fraction of Si3N4 pieces on Fe target, magnetization of the films decreased due to reduced Fe content and reduced grain size of bce crystalline phase, Temperature dependence and field dependence of magnetization of co-sputtered thin films can be explained bg a mixture of two types of particles showing paramagnetism and ferromagnetism.
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收藏
页码:3610 / 3612
页数:3
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