Nonlinear flux flow in TiN superconducting thin film

被引：45

作者：

Lefloch, F

Hoffmann, C

Demolliens, O

机构：

[1] CEA Grenoble, Dept Rech Fondamentale Mat Condensee, Serv Phys Stat Magnetisme & Supraconduct, F-38054 Grenoble 9, France

[2] CEA Grenoble, Dept Technol Avancees, LETI, DMEL, F-38054 Grenoble, France

来源：

PHYSICA C | 1999年 / 319卷 / 3-4期

关键词：

flux flow; thin films; electrical resistivity; granular superconductivity;

D O I：

10.1016/S0921-4534(99)00297-X

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have studied the superconducting behavior of a 100 nm titanium nitride (TiN) thin film in a perpendicular magnetic field. We found a zero field transition temperature of 4.6 K and a slope for the transition line in the H-T plane of -0.745 T/K. At 4.2 K, we have performed careful transport measurements by measuring both the differential resistivity and voltage as a function of a DC current. Our results are analyzed in the framework of linear and nonlinear flux flow behavior. In particular, we have observed an electronic instability at high vortex velocities, and from its dependence with respect to the applied magnetic field, we can extract the inelastic scattering time and the diffusion length of the quasiparticles, (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：258 / 266

页数：9

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