Enhancement of nitrogen gas breakdown voltage between coated aluminum electrodes with fluorocarbon polymer film prepared in C8F18 vapor RF plasma

被引:6
作者
Biloiu, C
Biloiu, IA
Sakai, Y
Suda, Y
Nakajima, M
机构
[1] Hokkaido Univ, Dept Ingn Elect & Informat, Sapporo, Hokkaido 0608628, Japan
[2] Fuji Elect Corp R&D Ltd, Ichihara 2908511, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2003年 / 42卷 / 2B期
关键词
breakdown voltage; fluorocarbon-polymer-film-coated electrode; Paschen curve; perfluorocarbon vapor;
D O I
10.1143/JJAP.42.L201
中图分类号
O59 [应用物理学];
学科分类号
摘要
The breakdown voltage (V-s) of nitrogen gas between aluminum (Al) sphere-sphere electrodes, which were coated with thin fluorocarbon polymer (FCP) films in a C8F18 vapor RF plasma, at a gas pressure (p) times gap length (d) between 0.6 Torr(.)cm and 20 Torr (.) cm was studied. The V-S in this electrode system was enhanced threefold at pd = 1 Torr(.)cm and twofold at 20 Torr(.)cm compared with V-s between the Al electrodes. The V-s enhancement mechanism was examined with respect to film insulation properties and secondary-electron emission from FCP film.
引用
收藏
页码:L201 / L203
页数:3
相关论文
共 20 条
[1]  
BILOIU C, 2001, P 25 ICPIG INT C PHY, V2, P129
[2]  
BLAIR DTA, 1978, ELECT BREAKDOWN GASE, P581
[3]   Electric field reduction due to charge accumulation in a dielectric-covered electrode system [J].
Blennow, HJM ;
Sjöberg, MLÅ ;
Leijon, MÅS ;
Gubanski, SM .
IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION, 2000, 7 (03) :340-345
[4]   Integration of fluorinated amorphous carbon as low-dielectric constant insulator: Effects of heating and deposition of tantalum nitride [J].
Chang, JP ;
Krautter, HW ;
Zhu, W ;
Opila, RL ;
Pai, CS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1999, 17 (05) :2969-2974
[5]   Sulfur hexafluoride and the electric power industry [J].
Christophorou, LG ;
Olthoff, JK ;
VanBrunt, RJ .
IEEE ELECTRICAL INSULATION MAGAZINE, 1997, 13 (05) :20-24
[6]  
DUTTON J, 1978, ELECT BREAKDOWN GASE, P228
[7]   Plasma deposition of low-dielectric-constant fluorinated amorphous carbon [J].
Endo, K ;
Shinoda, K ;
Tatsumi, T .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (05) :2739-2745
[8]   ELECTRICAL FIELD BREAKDOWN IN SULPHUR HEXAFLUORIDE [J].
GEORGE, DW ;
RICHARDS, PH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1969, 2 (10) :1470-&
[9]   COMBINED SPATIAL AND TEMPORAL STUDIES OF IONIZATION GROWTH IN NITROGEN [J].
HAYDON, SC ;
WILLIAMS, OM .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1976, 9 (03) :523-536
[10]   Flexible fluorocarbon wire coatings by pulsed plasma enhanced chemical vapor deposition [J].
Limb, SJ ;
Gleason, KK ;
Edell, DJ ;
Gleason, EF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (04) :1814-1818