Optimization of SERS-active substrates for near-field Raman spectroscopy

被引：73

作者：

Grand, J ^{[1
]}

Kostcheev, S ^{[1
]}

Bijeon, JL ^{[1
]}

de la Chapelle, ML ^{[1
]}

Adam, PM ^{[1
]}

Rumyantseva, A ^{[1
]}

Lérondel, G ^{[1
]}

Royer, P ^{[1
]}

机构：

[1] Univ Technol Troyes, Lab Nanotechnol & Instrumentat Opt, CNRS, F-10010 Troyes, France

来源：

SYNTHETIC METALS | 2003年 / 139卷 / 03期

关键词：

surface enhanced Raman scattering; surface plasmons; electron-beam lithography;

D O I：

10.1016/S0379-6779(03)00276-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

As a first step towards near-field Raman, we chose to study surface enhanced Raman scattering (SERS)-active substrates to cope with the weakness of Raman scattering (small cross-section and low concentration). We concentrated our work on localized surface plasmon (LSP) since they turned out to play a great part in SERS and we put forward the relation between LSP resonance and Raman enhancement. Roughness of our samples is controlled either by annealing process or electron-beam lithography (EBL); this latter technique proved to best suit to our study. Substrates are characterized by extinction spectroscopy which determines the LSP resonance and then Raman spectrum of a probe molecule, trans-1,2-bis(4-pyridyl)ethylene (BPE) is recorded. We show that maximum of enhancement is obtained when the LSP resonance is red-shifted (50 nm) compared to the excitation laser line (632.8 nm). (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：621 / 624

页数：4

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