Three-dimensional macroporous silicon photonic crystal with large photonic band gap -: art. no. 011101

被引：63

作者：

Schilling, J

White, J

Scherer, A

Stupian, G

Hillebrand, R

Gösele, U

机构：

[1] CALTECH, Pasadena, CA 91125 USA

[2] Aerosp Corp, Los Angeles, CA USA

[3] Max Planck Inst Microstruct Phys, D-06120 Halle Saale, Germany

来源：

APPLIED PHYSICS LETTERS | 2005年 / 86卷 / 01期

关键词：

D O I：

10.1063/1.1842855

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Three-dimensional photonic crystals based on macroporous silicon are fabricated by photoelectrochemical etching and subsequent focused-ion-beam drilling. Reflection measurements show a high reflection in the range of the stopgap and indicate the spectral position of the complete photonic band gap. The onset of diffraction which might influence the measurement is discussed. (C) 2005 American Institute of Physics.

引用

页码：011101 / 1

页数：3

共 17 条

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[2]

2-T

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