Saturation of the internal photoemission effect in forward biased silicon junctions

被引:3
作者
Saenz, ML [1 ]
Perez, JMG [1 ]
机构
[1] UNIV COMPLUTENSE MADRID, FAC CIENCIAS FIS,DEPT OPT, E-28040 MADRID, SPAIN
关键词
D O I
10.1103/PhysRevB.54.7662
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The behavior of the far-infrared laser-induced negative photoeffect in silicon homojunctions as a function of irradiation intensities is reported. A rate equation model treating this effect as a laser-heated hot-carrier internal photoemission is presented. The model predictions are compared to experimental results measured at 80 K, showing good agreement.
引用
收藏
页码:7662 / 7665
页数:4
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