Crystalline structure of YSZ thin films deposited on Si(111) substrate by chemical vapor deposition

被引：4

作者：

Hwang, SC ^{[1
]}

Lee, HG ^{[1
]}

Shin, HS ^{[1
]}

机构：

[1] Chonbuk Natl Univ, Sch Chem Engn, Chonju 561756, Chonbuk, South Korea

来源：

KOREAN JOURNAL OF CHEMICAL ENGINEERING | 1998年 / 15卷 / 03期

关键词：

YSZ thin film; Si substrate; CVD; XPS; XRD;

D O I：

10.1007/BF02707078

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Yttria-stabilized zirconia (YSZ) thin films were formed on Si(lll) substrate by chemical vapor deposition (CVD) in a temperature range of 650-800 degrees C using beta-diketone metal chelates. The scanning electron microscopy (SEM) and X-ray diffraction (XRD) data evidenced that YSZ thin films have a smooth surface with fine grains and crystalline structure, respectively. The crystalline structure of YSZ films was affected by the deposition temperature. The X-ray photoelectron spectroscopy (XPS) data indicated that the YSZ film grows thick enough to prevent the diffusion of Si.

引用

页码：243 / 245

页数：3

共 6 条

[1] STUDY OF Y1BA2CU3O7-DELTA FILM GROWTH ON (200) ORIENTED YTTRIA-STABILIZED ZIRCONIA BUFFER LAYER ON METALLIC SUBSTRATES [J].

CHATTERJEE, R ;

FUKUTOMI, M ;

AOKI, S ;

TOGANO, K ;

MAEDA, H .

APPLIED PHYSICS LETTERS, 1994, 65 (01) :109-111

[2] THERMAL-EXPANSION COEFFICIENTS OF HIGH-TC SUPERCONDUCTORS [J].

HASHIMOTO, T ;

FUEKI, K ;

KISHI, A ;

AZUMI, T ;

KOINUMA, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1988, 27 (02) :L214-L216

[3] INPLANE ALIGNED YBA2CU3O7-X THIN-FILMS DEPOSITED ON POLYCRYSTALLINE METALLIC SUBSTRATES [J].

IIJIMA, Y ;

TANABE, N ;

KOHNO, O ;

IKENO, Y .

APPLIED PHYSICS LETTERS, 1992, 60 (06) :769-771

[4] ON THE REACTIONS OF QUENCHED BAYCUO POWDERS WITH VARIOUS MATERIALS [J].

KOMATSU, T ;

TANAKA, O ;

MATUSITA, K ;

TAKATA, M ;

YAMASHITA, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (06) :L1025-L1028

[5] LASER DEPOSITION OF BIAXIALLY TEXTURED YTTRIA-STABILIZED ZIRCONIA BUFFER LAYERS ON POLYCRYSTALLINE METALLIC ALLOYS FOR HIGH CRITICAL CURRENT Y-BA-CU-O THIN-FILMS [J].

READE, RP ;

BERDAHL, P ;

RUSSO, RE ;

GARRISON, SM .

APPLIED PHYSICS LETTERS, 1992, 61 (18) :2231-2233

[6]

SHIN HS, 1993, HWAHAK KONGHAK, V31, P131

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