One-step fabrication of polymer thin films with lithographic bas-relief micro-pattern and self-organized micro-porous structure

被引:24
作者
Ohzono, T
Nishikawa, T
Shimomura, M
机构
[1] RIKEN, Frontier Res Syst, Spatiotemporal Funct Mat Res Grp, Dissipat Hierarchy Struct Lab, Wako, Saitama 3510198, Japan
[2] Hokkaido Univ, Res Inst Elect Sci, Nanotechnol Res Ctr, Sapporo, Hokkaido 0600812, Japan
关键词
Polymer; Thin Film; Polymer Thin Film;
D O I
10.1023/B:JMSC.0000017799.20962.4f
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The one-step fabrication of polymer thin films with lithographic bas-relief micro-pattern and self-organized micro-porous structure was described. The patterned films were fabricated on poly(dimethyl siloxane)[PDMS], an elastomer substrates with bas-relief patterns. The amphiphilic copolymer used for the fabrication of patterned films films was synthesized. The PDMS was cured on the master pattern at 60°C for 4h.
引用
收藏
页码:2243 / 2247
页数:5
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