Study and development of an alkaline bath for copper deposition containing sorbitol as complexing agent and morphological characterization of the copper film

被引:45
作者
Barbosa, LL
de Almeida, MRH
Carlos, RM
Yonashiro, M
Oliveira, GM
Carlos, IA
机构
[1] Univ Fed Sao Carlos, Dept Quim, BR-13565905 Sao Carlos, SP, Brazil
[2] FIMI, Inst Maria Inmaculada, Dept Quim, Mogi Guacu, SP, Brazil
关键词
copper; sorbitol-alkaline bath; AISI; 1010; steel; noncyanide bath;
D O I
10.1016/j.surfcoat.2004.09.011
中图分类号
TB3 [工程材料学];
学科分类号
0805 [材料科学与工程]; 080502 [材料学];
摘要
cyanide-free copper deposition bath was developed using sorbitol as complexing agent for Cu(II). The plating bath was characterized by potentiometric titration, UV-visible (UV-VIS) spectroscopic and electrochemical techniques, and the copper films were analysed by scanning electron microscopy (SEM). Extensive results collected by these four techniques showed that two different Cu(II) species were present in the copper bath: [Cu (sorb)(2)](-) and [Cu (sorb)(2)](2-). The presence of sorbitol in the plating bath led to formation of golden copper film of thickness of 42 mum at a plating current efficiency of 94%. These results were comparable with that of a high-efficiency cyanide copper bath. SEM results also indicated that sorbitate anions act as a brightener inasmuch as the copper crystallites were smaller and the copper film smoother than those obtained from glycerol-alkaline solutions. Furthermore, this polyalcohol acts as a leveller inasmuch as the films were more level than the ones obtained in the presence of glycerol. AFM showed that the roughness of the 1010 steel substrate was similar to that of the copper film coating it, thus a nucleation loop could not be observed in the voltammograms. (C) 2004 Elsevier B.V All rights reserved.
引用
收藏
页码:145 / 153
页数:9
相关论文
共 34 条
[1]
ALMEIDA MRH, 2002, J APPL ELECTROCHEM, V32, P763
[2]
DETERMINATION OF THE CHARGE OF COMPLEX SPECIES THAT ARE REDUCED AT THE DME AND OF THE COEFFICIENT OF TRANSFER, ALPHA, IN THE CU(II)-AQ - M CITRATE (M-LI+, NA+ AND K+) SYSTEM [J].
ALVAREZ, V ;
GONZALEZ, S ;
AREVALO, A .
ELECTROCHIMICA ACTA, 1984, 29 (09) :1187-1190
[3]
BARBOSA LL, 2001, ANAIS 12 SIBEE GRAMA
[4]
BERTON MAC, 1994, THESIS U FEDERAL SAO
[5]
BERTOUCCI U, 1974, ENCY ELEMENTS, V6, P465
[6]
Brenner A., 1963, ELECTRODEPOSITION AL
[7]
Study of the influence of glycerol on the cathodic process of lead electrodeposition and on its morphology [J].
Carlos, IA ;
Malaquias, MA ;
Oizumi, MM ;
Matsuo, TT .
JOURNAL OF POWER SOURCES, 2001, 92 (1-2) :56-64
[8]
Voltammetric study of lead electrodeposition in the presence of sorbitol and morphological characterization [J].
Carlos, IA ;
Siqueira, JLP ;
Finazzi, GA ;
de Almeida, MRH .
JOURNAL OF POWER SOURCES, 2003, 117 (1-2) :179-186
[9]
CARLOS IA, 1997, INTERFINISH LATINO A
[10]
CARLOS IA, 1990, THESIS U FEDERAL SAO