Mo/Si multilayer coating technology for EUVL, coating uniformity and time stability

被引：11

作者：

Louis, E ^{[1
]}

Yakshin, AE ^{[1
]}

Görts, PC ^{[1
]}

Oestreich, S ^{[1
]}

Maas, ELG ^{[1
]}

Kessels, MJH ^{[1
]}

Schmitz, D ^{[1
]}

Scholze, F ^{[1
]}

Ulm, G ^{[1
]}

Müllender, S ^{[1
]}

Haidl ^{[1
]}

Bijkerk, F ^{[1
]}

机构：

[1] FOM, Inst Plasma Phys Rijnhuizen, NL-3430 BE Nieuwegein, Netherlands

来源：

SOFT X-RAY AND EUV IMAGING SYSTEMS | 2000年 / 4146卷

关键词：

Mo/Si multilayer coatings; normal-incidence reflectivity; electron-beam deposition; EUVL;

D O I：

10.1117/12.406676

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

High performance reflective coatings for EUVL projection systems can be produced by using e-beam evaporation in combination with ion beam smoothening of the interfaces. Using this technique, we recently demonstrated a near normal incidence reflectivity of 69.5 %(1). Another, equally important part of the optimization of the coating process is the lateral control of the thickness of the layers, that is the d-spacing of the coating. In this paper we demonstrate the ability to obtain a uniformity of the d-spacing of the coating of better than +/-0.05% over a 6" area both on flat and concave surfaces (uniformity specified in terms of wavelength of maximum reflectance), All reflectance measurements have been carried out at the PTB facilities at the electron storage rings BESSY I and BESSY II in Berlin(2).

引用

页码：60 / 63

页数：4

共 4 条

[1] Progress in Mo/Si multilayer coating technology for EUVL optics [J].

Louis, E ;

Yakshin, AE ;

Görts, PC ;

Oestreich, S ;

Stuik, R ;

Maas, ELG ;

Kessels, MJH ;

Bijkerk, F ;

Haidl, M ;

Müllender, S ;

Mertin, M ;

Schmitz, D ;

Scholze, F ;

Ulm, G .

EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 :406-411

[2] Multilayer reflective coatings for extreme-ultraviolet lithography [J].

Montcalm, C ;

Bajt, S ;

Mirkarimi, PB ;

Spiller, E ;

Weber, FJ ;

Folta, JA .

EMERGING LITHOGRAPHIC TECHNOLOGIES II, 1998, 3331 :42-51

[3] Extended-source interferometry for at-wavelength test of EUV-optics. [J].

Visser, M ;

Dekker, M ;

Hegeman, P ;

Braat, J .

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 :253-263

[4] A shearing interferometer to characterize EUV optics with a laser plasma source. [J].

Visser, M ;

Constantinescu, R ;

Hegeman, P ;

Jonkers, J ;

Dekker, M ;

Louis, E ;

Hambach, D .

EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 :733-739

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