Sub-micron thin film intrinsic Josephson junctions

被引:10
作者
Warburton, PA
Kuzhakhmetov, AR
Bell, C
Burnell, G
Blamire, MG
Wu, H
Grovenor, CRM
Schneidewind, H
机构
[1] UCL, Dept Elect & Elect Engn, London WC1E 7JE, England
[2] Univ Cambridge, Dept Mat Sci, Cambridge CB2 3QZ, England
[3] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
[4] IPHT Jena, D-07745 Jena, Germany
关键词
focussed ion-beam milling; Josephson junctions; nanofabrication;
D O I
10.1109/TASC.2003.814056
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have fabricated sub-micron intrinsic Josephson junctions in thin films of Tl-Ba-Ca-Cu-O using two differing techniques suited to different applications. By using lateral focussed ion-beam milling we have created arrays of intrinsic junctions in c-axis oriented films. Such arrays, with areas as low as 0.25 mum(2), display large hysteresis comparable to that observed in single-crystal intrinsic junctions. By using normal focussed ion-beam milling we have created arrays in mis-aligned films grown on vicinal substrates. In arrays of area less than 0.4 mum(2) we observe Josephson phase diffusion and a suppressed critical current, showing that charging effects may be significant in these junctions.
引用
收藏
页码:821 / 824
页数:4
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