Alignment mechanism of carbon nanofibers produced by plasma-enhanced chemical-vapor deposition

被引:189
作者
Merkulov, VI [1 ]
Melechko, AV
Guillorn, MA
Lowndes, DH
Simpson, ML
机构
[1] Oak Ridge Natl Lab, Mol Scale Engn & Nanoscale Technol Res Grp, Oak Ridge, TN 37831 USA
[2] Univ Tennessee, Knoxville, TN 37996 USA
关键词
D O I
10.1063/1.1415411
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report experimental evidence showing a direct correlation between the alignment of carbon nanofibers (CNFs) prepared by plasma-enhanced chemical-vapor deposition and the location of the catalyst particle during CNF growth. In particular, we find that CNFs that have a catalyst particle at the tip (i.e., growth proceeds from the tip) align along the electric-field lines, whereas CNFs with the particle at the base (i.e., growth proceeds from the base) grow in random orientations. We propose a model that explains the alignment process as a result of a feedback mechanism associated with a nonuniform stress (part tensile, part compressive) that is created across the interface of the catalyst particle with the CNF due to electrostatic forces. Furthermore, we propose that the alignment seen recently in some dense CNF films is due to a crowding effect and is not directly the result of electrostatic forces. (C) 2001 American Institute of Physics.
引用
收藏
页码:2970 / 2972
页数:3
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