Formation energies and chemical potential diagrams of II-Ge-N2 semiconductors

被引:8
作者
Jaroenjittichai, Atchara Punya [1 ]
机构
[1] Chiang Mai Univ, Fac Sci, Dept Phys & Mat Sci, Chiang Mai, Thailand
关键词
DFT; FP-LMTO; II-Ge-N-2; semiconductor; formation energy;
D O I
10.1080/10584587.2016.1204202
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
III-Nitride wide band gap semiconductors are well known for optoelectronic and electronic applications. They however have disadvantages, for example, the high cost of Indium, difficulties of p-type doping and phase separation in their alloys. In this work, the novel II-Ge-N-2 semiconductors that are related to III-N by replacing the group-III with a group-II (Mg and Cd) and a group-IV (Ge) are investigated. The lattice parameters of the II-Ge-N-2 are predicted by a full potential linear muffin-tin orbital (FP-LMTO) approach within the generalized gradient approximation (GGA). The results are also compared with those of ZnGeN2. Furthermore, the formation energies of the new materials and their competing compounds, such as Zn3N2, Mg3N2, Cd3N2 and Ge3N4, are calculated from the constituent elements. The chemical potential diagrams for stability, which are constructed from the calculated formation energies, facilitate us to determine the allowed ranges of the chemical potentials of the elements where the compounds are stable at zero temperature and pressure.
引用
收藏
页码:186 / 192
页数:7
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