Single- and double-shelled coaxial nanocables of GaP with silicon oxide and carbon

被引:33
作者
Bae, SY [1 ]
Seo, HW [1 ]
Choi, HC [1 ]
Han, DS [1 ]
Park, J [1 ]
机构
[1] Korea Univ, Dept Chem, Jochiwon 339700, South Korea
关键词
D O I
10.1021/jp046501e
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Coaxial nanocables of gallium phosphide (Gal?) core with three different-typed single and double shells (i.e., silicon oxide (SiOx), carbon (C), and SiOx/C) were exclusively synthesized by the chemical vapor deposition method. The GaP/SiOx, nanocables were directly grown on gold-deposited silicon substrates. Deposition of C on the GaP nanowires and GaP/SiOx nanocables produces the GaP/C and GaP/SiOx/C nanocables, respectively. The outer diameter of the nanocables is < 50 nm. The thickness and crystallinity of the C outer layers were controllable by the growth conditions. X-ray photoelectron spectroscopy, X-ray diffraction, Raman spectroscopy, and photoluminescence reveal that the outer layer formation reduces the surface defects of GaP nanowires. A great enhancement of the conductivity due to the C outer layers has been measured by the four-probe method. The growth process of these nanocables has been discussed on the basis of the vapor- liquid- solid mechanism.
引用
收藏
页码:8496 / 8502
页数:7
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