Increased oxidative damage to all DNA bases in patients with type II diabetes mellitus

被引:95
作者
Rehman, A
Nourooz-Zadeh, J
Möller, W
Tritschler, H
Pereira, P
Halliwell, B
机构
[1] Kings Coll London, Pharmacol Grp, Int Antioxidant Res Ctr, London SW3 6LX, England
[2] UCL, Dept Med, Ctr Clin Pharmacol & Therapeut Toxicol, London WC1E 6JJ, England
[3] Asta Med, D-6000 Frankfurt, Germany
[4] Biomed Inst Res Light & Image, Dept Ophthalmol & Visual Sci, Coimbra, Portugal
[5] Natl Univ Singapore, Dept Biochem, Singapore 119260, Singapore
关键词
diabetes; oxidative stress; DNA damage; hydroxyl radical;
D O I
10.1016/S0014-5793(99)00339-7
中图分类号
Q5 [生物化学]; Q7 [分子生物学];
学科分类号
071010 ; 081704 ;
摘要
Gas chromatography-mass spectrometry was used to measure the oxidative DNA damage in diabetic subjects and controls. Levels of multiple DNA base oxidation products, but not DNA base de-amination or chlorination products, were found to be elevated in white blood cell DNA from patients with type II diabetes as compared with age-matched controls. The chemical pattern of base damage is characteristic of that caused by an attack on DNA by hydroxyl radical. An increased formation of the highly reactive hydroxyl radical could account for many of the reports of oxidative stress in diabetic subjects. There was no evidence of an increased DNA damage by reactive nitrogen or chlorine species. (C) 1999 Federation of European Biochemical Societies.
引用
收藏
页码:120 / 122
页数:3
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