Optical lithography: Introduction

被引：43

作者：

Chiu, GLT ^{[1
]}

Shaw, JM ^{[1
]}

机构：

[1] IBM CORP,DIV RES,THOMAS J WATSON RES CTR,MAT & PROC GRP,YORKTOWN HTS,NY 10598

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1997年 / 41卷 / 1-2期

关键词：

General review (GEN);

D O I：

10.1147/rd.411.0003

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

[No abstract available]

引用

页码：3 / 6

页数：4

共 13 条

[1]

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[2]

CUTHBERT JD, 1977, SOLID STATE TECHNOL, V20, P59

[3]

ELLIOTT DJ, 1989, INTEGRATED CIRCUIT F

[4]

GOODMAN DS, 1985, P MICROCIRCUIT ENG, V85, P355

[5] ELECTRON-BEAM LITHOGRAPHY TOOL FOR MANUFACTURE OF X-RAY MASKS [J].

GROVES, TR ;

HARTLEY, JG ;

PFEIFFER, HC ;

PUISTO, D ;

BAILEY, DK .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1993, 37 (03) :411-419

[6] ON THE DIFFRACTION THEORY OF OPTICAL IMAGES [J].

HOPKINS, HH .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1953, 217 (1130) :408-432

[7]

JONES GW, 1989, PRINCIPLES ELECT PAC

[8]

Moreau W.M., 1988, SEMICONDUCTOR LITHOG

[9]

REICHMANIS E, 1993, POLYM ELECT PHOTONIC

[10] ULTRAVIOLET-LASER ABLATION OF ORGANIC POLYMERS [J].

SRINIVASAN, R ;

BRAREN, B .

CHEMICAL REVIEWS, 1989, 89 (06) :1303-1316

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