Chemical compositions of organosilicon thin films deposited on aluminium foil by atmospheric pressure dielectric barrier discharge and their electrochemical behaviour

被引：31

作者：

Boscher, Nicolas D. ^{[1
]}

Choquet, Patrick ^{[1
]}

Duday, David ^{[1
]}

Verdier, Stephane ^{[2
]}

机构：

[1] Ctr Rech Publ Gabriel Lippmann, Dept Sci & Anal Mat, L-4422 Belvaux, Luxembourg

[2] Ctr Rech Publ Gabriel Lippmann, Foil Innovat Ctr, L-4422 Belvaux, Luxembourg

来源：

SURFACE & COATINGS TECHNOLOGY | 2010年 / 205卷 / 07期

关键词：

Aluminium; EIS; IR spectroscopy; TEM; XPS; Polymer coating; 2P CORE-LEVEL; CORROSION PERFORMANCE; MECHANICAL-PROPERTIES; SILOXANE COATINGS; PLASMA; PRECURSORS; LAYERS; XPS; POLYESTER; CONSTANT;

D O I：

10.1016/j.surfcoat.2010.09.037

中图分类号：

TB3 [工程材料学];

学科分类号：

082905 [生物质能源与材料];

摘要：

Atmospheric pressure dielectric barrier discharge (AP-DBD) deposition of organosilicon thin films on aluminium foils was investigated over a range of discharge parameters. Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), Fourier Transform Infrared Spectroscopy (FTIR) and X-ray Photoelectron Spectroscopy (XPS) analyses showed how variations of the plasma gas composition and deposition conditions affect the composition, structure and morphology of the films. The corrosion behaviour of the films was characterised by electrochemical techniques. Relationships between the deposition parameters, film chemistry and electrochemical properties of these films are reported. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：2438 / 2448

页数：11

共 36 条

[1]

A study of HMDSO/O2 plasma deposits using a high-sensitivity and -energy resolution XPS instrument:: curve fitting of the Si 2p core level [J].

Alexander, MR ;

Short, RD ;

Jones, FR ;

Michaeli, W ;

Blomfield, CJ .

APPLIED SURFACE SCIENCE, 1999, 137 (1-4) :179-183

[2]

*ASTM, 1986, ANN BOOK ASTM STAND, P19103

[3]

Deposition of polysiloxane-like nanofilms onto an aluminium alloy by plasma polymerized hexamethyldisiloxane: characterization by XPS and contact angle measurements [J].

Azioune, A. ;

Marcozzi, M. ;

Revello, V. ;

Pireaux, J. J. .

SURFACE AND INTERFACE ANALYSIS, 2007, 39 (07) :615-623

[4]

Electrochemical behaviour of thin films deposited by plasma DBD torch on copper: An O2-diffusion barrier [J].

Barchiche, Chems-Eddine ;

Duday, David ;

Choquet, Patrick ;

Migeon, Henri-Noel ;

Rocca, Emmanuel .

ELECTROCHIMICA ACTA, 2009, 54 (24) :5789-5795

[5]

Advantages of a Pulsed Electrical Excitation Mode on the Corrosion Performance of Organosilicon Thin Films Deposited on Aluminium Foil by Atmospheric Pressure Dielectric Barrier Discharge [J].

Boscher, Nicolas D. ;

Choquet, Patrick ;

Duday, David ;

Verdier, Stephane .

PLASMA PROCESSES AND POLYMERS, 2010, 7 (02) :163-171

[6]

Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas [J].

Bousquet, A. ;

Bursikova, V. ;

Goullet, A. ;

Djouadi, A. ;

Zajickova, L. ;

Granier, A. .

SURFACE & COATINGS TECHNOLOGY, 2006, 200 (22-23) :6517-6521

[7]

ELECTRICAL MEASUREMENTS IN THE STUDY OF IMMERSED PAINT COATINGS ON METAL .1. COMPARISON BETWEEN CAPACITANCE AND GRAVIMETRIC METHODS OF ESTIMATING WATER-UPTAKE [J].

BRASHER, DM ;

KINGSBURY, AH .

JOURNAL OF APPLIED CHEMISTRY, 1954, 4 (02) :62-72

[8]

Dynamics and temperature dependence of etching processes of porous and barrier aluminum oxide layers [J].

Brevnov, DA ;

Rao, GVR ;

López, GP ;

Atanassov, PB .

ELECTROCHIMICA ACTA, 2004, 49 (15) :2487-2494

[9]

Organosilicon thin films deposited from cyclic and acyclic precursors using water as an oxidant [J].

Burkey, DD ;

Gleason, KK .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004, 151 (05) :F105-F112

[10]

Transport phenomena in an atmospheric-pressure townsend discharge fed by N2/N2O/HMDSO mixtures [J].

Enache, Ionut ;

Caquineau, Hubert ;

Gherardi, Nicolas ;

Paulmier, Thierry ;

Maechler, Louison ;

Massines, Francoise .

PLASMA PROCESSES AND POLYMERS, 2007, 4 (09) :806-814

← 1 2 3 4 →