XPS study of carbon nitride films deposited by hot filament chemical vapor deposition using carbon filament

被引：17

作者：

Aono, Masami ^{[1
]}

Aizawa, Shinichiro ^{[1
]}

Kitazawa, Nobuaki ^{[1
]}

Watanabe, Yoshihisa ^{[1
]}

机构：

[1] Natl Def Acad, Kanagawa 2398686, Japan

来源：

THIN SOLID FILMS | 2008年 / 516卷 / 05期

关键词：

amorphous materials; carbon nitride; XPS; binding energy;

D O I：

10.1016/j.tsf.2007.06.180

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Amorphous carbon nitride, a-CNx, thin films were deposited by hot filament CVD using a carbon filament with dc negative bias voltage on the substrate. The effects of the negative bias and the filament components on the binding structure of the films are investigated by XPS. The composition ratio of graphite to amorphous carbon in the filaments affects the bonding structure of carbon and nitrogen in the films, although the nitrogen content in the films is almost same as 0.1. The nitrogen content in the films changes from 0.1 to 0.3 as the negative bias changes from 0 to -300 V. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：648 / 651

页数：4

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