Kinetics of O-2+TEOS gas-phase chemical reactions in a remote RF plasma reactor with electron spin resonance

被引：10

作者：

Janca, J

Talsky, A

Zvonicek, V

机构：

[1] Department of Physical Electronics, Faculty of Science, Masaryk University, Brno, 611 37

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1996年 / 16卷 / 02期

关键词：

TEOS; ESR; rate coefficients; remote microwave discharge;

D O I：

10.1007/BF01570177

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Kinetics of the reaction O + TEOS (tetraethoxysilane) was studied by means of the ESR method Molecular oxygen was partially atomized by a 13.56-MHz discharge in the quartz tube that passed inside an ESR cavity. TEOS vapors were injected between the discharge and ESR cavity. O-atom loss occurring due to the reaction of atomic oxygen with TEOS molecules was measured and the rate coefficient k(1) of the reaction of O atoms with TEOS molecules was determined The obtained results could be used for deposition process simulations.

引用

页码：187 / 194

页数：8

共 13 条

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