Dynamic roughening of tetrahedral amorphous carbon

被引：91

作者：

Casiraghi, C ^{[1
]}

Ferrari, AC

Ohr, R

Flewitt, AJ

Chu, DP

Robertson, J

机构：

[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England

[2] IBM STD, D-55131 Mainz, Germany

[3] Cambridge Res Lab Epson, Cambridge CB4 0FE, England

来源：

PHYSICAL REVIEW LETTERS | 2003年 / 91卷 / 22期

关键词：

D O I：

10.1103/PhysRevLett.91.226104

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The roughness of tetrahedral amorphous carbon (ta-C) films grown at room temperature is measured as a function of film thickness by atomic force microscopy, to extract roughness and growth exponents of alphasimilar to0.39 and betasimilar to0-0.1, respectively. This extremely small growth exponent shows that some form of surface diffusion and relaxation operates at a homologous temperature of 0.07, much lower than in any other material. This is accounted for by a Monte Carlo simulation, which assumes a smoothening during a thermal spike, following energetic ion deposition. The low roughness allows ta-C to be used as an ultrathin protective coating on magnetic disk storage systems with similar to1 Tbit/in.(2) storage density.

引用

页数：4

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