Structural changes in fused silica after exposure to focused femtosecond laser pulses

被引:360
作者
Chan, JW
Huser, T
Risbud, S
Krol, DM
机构
[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA
[2] Univ Calif Davis, Dept Chem Engn & Mat Sci, Davis, CA 95616 USA
[3] Univ Calif Davis, Dept Appl Sci, Livermore, CA 94550 USA
关键词
D O I
10.1364/OL.26.001726
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Using in situ Raman scattering in a confocal microscopy setup, we have observed changes in the network structure of fused silica after modifying regions inside the glass with tightly focused 800-nm 130-fs laser pulses at fluences of 5-200 J cm(-2). The Raman spectra show a large increase in the peaks at 490 and 605 cm(-1), owing to 4- and 3-membered ring structures in the silica network, indicating that densification occurs after exposure to the femtosecond laser pulses. The results are consistent with the formation of a localized plasma by the laser pulse and a subsequent microexplosion inside the glass. (C) 2001 Optical Society of America.
引用
收藏
页码:1726 / 1728
页数:3
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