PECVD grown multiple core planar waveguides with extremely low interface reflections and losses

被引：10

作者：

Laurent-Lund, C ^{[1
]}

Poulsen, MR

Beukema, M

Pedersen, JE

机构：

[1] Tech Univ Denmark, Mikroelektron Centret, DK-2800 Lyngby, Denmark

[2] Tech Univ Denmark, IONAS AS, DK-2800 Lyngby, Denmark

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 1998年 / 10卷 / 10期

关键词：

coplanar waveguides; dielectric waveguides; functional separation; integrated optics; optical planar waveguide components; waveguide transitions;

D O I：

10.1109/68.720284

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A novel and generic method for fabricating silica-on-silicon planar lightwave circuits with cores composed of two or more different types of glasses is described. The basic process technologies used are silane/germane/nitrous-oxide based plasma enhanced chemical vapor deposition and fluorine based reactive ion etching. Very high-quality interfaces between the different core glasses are obtained with interface losses as low as 0.022 +/- 0.012 dB and reflection levels below -80 dB. This technique adds flexibility and ease to the design of complex silica planar waveguide components, allowing, e.g., independent optimization of amplifying and passive sections in lossless devices based on erbium-doped planar waveguides.

引用

页码：1431 / 1433

页数：3