Photolabile protecting groups for nucleosides: Synthesis and photodeprotection rates

被引:140
作者
Hasan, A
Stengele, KP
Giegrich, H
Cornwell, P
Isham, KR
Sachleben, RA
Pfleiderer, W
Foote, RS
机构
[1] OAK RIDGE NATL LAB,DIV CHEM & ANALYT SCI,OAK RIDGE,TN 37831
[2] OAK RIDGE NATL LAB,DIV BIOL,OAK RIDGE,TN 37831
[3] UNIV KONSTANZ,FAK CHEM,D-78434 CONSTANCE,GERMANY
关键词
D O I
10.1016/S0040-4020(97)00154-3
中图分类号
O62 [有机化学];
学科分类号
070303 ; 081704 ;
摘要
o-Nitrobenzyloxycarbonyl and a number of related groups have been tested for the photolabile protection of nucleoside 5'-hydroxyls. The rates of photodeprotection were found to vary by approximately 17 fold in a series of 5'-O-protected thymidine derivatives irradiated at 365 nm under identical conditions. The homologous 2-(o-nitrophenyl)ethoxycarbonyl group and its derivatives were found to be removed approximately 2-fold faster than the corresponding o-nitrobenzyloxycarbonyl group, possibly due to an increased rare of alpha-hydrogen abstraction by the photo-excited nitro group. Photolysis rates were affected by substitutions on both the phenyl ring and alpha-carbon, with the strongest rate enhancements caused by the presence of a methyl or second o-nitrophenyl group in the alpha-position. Among the ring-substituted derivatives studied, o-nitro and o-iodo had the strongest enhancement effects on photodeprotection, while an o-fluoro group reduced the rate of photodeprotection. In general, substitutions at other positions on the phenyl ring had less effect on photolysis rates. (C) 1997 Elsevier Science Ltd.
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页码:4247 / 4264
页数:18
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