Fabrication of optical waveguides by 2 MeV Ar+ irradiation of germanium-doped flame-hydrolysis deposited silica

被引：7

作者：

García-Blanco, S

Kellock, AJ

Baglin, JEE

Glidle, A

Cooper, JM

Aitchison, JS

De La Rue, RM

机构：

[1] Univ Glasgow, Dept Elect & Elect Engn, Glasgow G12 8LT, Lanark, Scotland

[2] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

[3] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G4, Canada

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2003年 / 206卷

关键词：

flame-hydrolysis; silica; ion-implantation; waveguide; refractive-index;

D O I：

10.1016/S0168-583X(03)00789-4

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

In this paper, the effects of irradiation of Ge-doped FHD silica with 2 MeV Ar+ ions were optically characterized using an m-line technique based on grating couplers. An increase of refractive index as high as 1.2 x 10(-2) was obtained, larger than the values normally reported for UV or electron-beam irradiation of the same material (typically of approximate to10(-3)). Thermal annealing has been carried out and an activation energy of 0.36 eV for the recovery of the refractive index has been estimated, suggesting that a bond rearrangement mechanism could be responsible for the change in refractive index. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：440 / 443

页数：4

共 14 条

[1] Implantation-induced structural changes and hydration in silicate glasses [J].