In-depth characterization of damage produced by swift heavy ion irradiation using a tapping mode atomic force microscope

The damage produced by 209 MeV Kr ions in three different materials, muscovite mica (MM), an insulator; Si, a semiconductor; and Highly Oriented Pyrolithic Graphite (HOPG), a semimetal is investigated in the entire depth of penetration. The comparison of damage in the three materials shows similarities between MM and HOPG, while the damage found on Si is completely different from that found in the previous two. In all three materials damage produced around the trajectory of individual particles was identified. Production mechanisms are proposed for the observed features. The contrast mechanism of Tapping Mode AFM is discussed for some of the observed features.