Nanoindentation testing of SU-8 photoresist mechanical properties

被引：55

作者：

Al-Halhouji, A. T. ^{[1
]}

Kampen, I. ^{[2
]}

Krah, T. ^{[1
]}

Buettgenbach, S. ^{[1
]}

机构：

[1] Tech Univ Carolo Wilhelmina Braunschweig, Inst Microtechnol, D-38124 Braunschweig, Germany

[2] Tech Univ Carolo Wilhelmina Braunschweig, Inst Particle Technol, D-38104 Braunschweig, Germany

来源：

MICROELECTRONIC ENGINEERING | 2008年 / 85卷 / 5-6期

关键词：

nanoindentation; SU-8; Young's modulus;

D O I：

10.1016/j.mee.2008.01.033

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this work, quasi-static and dynamic tests for the mechanical properties of SU-8 using a nanomechanical triboindenter were performed. Load-displacement data for the indenter as it is driven into and withdrawn from the photoresist patterns are reported. Berkovich-shaped indenter was used in the experimental measurements of the following mechanical properties: reduced elastic modulus, hardness, energy storage modulus and energy loss modulus. The Young's modulus of the SU-8 photoresist was also determined. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：942 / 944

页数：3

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