Studies of nanostructured copper/hydrogenated amorphous carbon multilayer films

被引:52
作者
Dwivedi, Neeraj [1 ]
Kumar, Sushil [1 ]
Ishpal [1 ]
Dayal, Saurabh [1 ]
Govind [2 ]
Rauthan, C. M. S. [1 ]
Panwar, O. S. [1 ]
机构
[1] CSIR, Natl Phys Lab, Plasma Proc Mat Grp, New Delhi 110012, India
[2] CSIR, Natl Phys Lab, Surface Phys & Nano Struct Grp, New Delhi 110012, India
关键词
Multilayer; Low vacuum; Nanostructure; DIAMOND-LIKE CARBON; FIELD-EMISSION; THIN-FILMS; MECHANICAL-PROPERTIES; SOLAR-CELL; SPECTROSCOPY; NANOTUBES; GROWTH;
D O I
10.1016/j.jallcom.2010.10.016
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Nanostructured copper/hydrogenated amorphous carbon (a-C H) multilayer grown in a low base vacuum (1 x 10(-3) Torr) system combining plasma-enhanced chemical vapor deposition and sputtering techniques These nanostructured multilayer were found to exhibit Improved electrical optical surface and structural properties compared to that of monolayer a-C H films The residual stresses of such multilayer structure were found well below 1 C Pa Scanning electron microscopy and atomic force microscopy results revealed a nanostructured surface morphology and low surface roughnesses values X-ray photoelectron spectroscopy secondary ion mass spectroscopy and energy dispersive X-ray analysis confirmed a very small amount of copper in these films These structures exhibited very high optical transparency in the near infrared region (similar to 90%) and the optical band gap varied from 1 35 to 1 7 eV It was noticed that the temperature dependent conductivity improved due to the presence of both copper and the nano-structured morphology (C) 2010 Elsevier B V All rights reserved
引用
收藏
页码:1285 / 1293
页数:9
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