Phase transitions, stability, and dielectric response of the domain structure in ferroelectric-ferroelastic thin films

被引:38
作者
Bratkovsky, AM
Levanyuk, AP
机构
[1] Hewlett Packard Labs, Palo Alto, CA 94304 USA
[2] Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
关键词
D O I
10.1103/PhysRevLett.86.3642
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The first analytical study of phase transitions and domain structure in ferroelastic-ferroelectric epitaxial thin films is presented for an exactly solvable model. The emerging domain structure with domains of equal width (which may be exponentially large) remains stable irrespective of the him thickness. Shifts of the domain walls, unexpectedly, contribute nothing (or insignificantly) to the dielectric response of the film. Generally, the motion of the domain walls results in about the same contribution to the response as the one that comes from a standard bulk term. Therefore, no particular softening of the dielectric response is expected to occur due to the motion of domain walls.
引用
收藏
页码:3642 / 3645
页数:4
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