Mechanical properties of poly-methyl methacrylate (PMMA) for nano imprint lithography

被引：45

作者：

Hirai, Y

Yoshikawa, T

Takagi, N

Yoshida, S

Yamamoto, K

机构：

[1] Univ Osaka Prefecture, Grad Sch Engn, Sakai, Osaka 5998531, Japan

[2] Technol Res Inst Osaka Prefecture, Dept Mat Technol, Izumi, Osaka 5941157, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2003年 / 16卷 / 04期

关键词：

modulus; viscosity; retardation time; strain rate; imprint lithography; molecular weight; poly methyl methacrylate;

D O I：

10.2494/photopolymer.16.615

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Mechanical property of a polymer over glass transition temperature is an important factor to design process conditions in nano imprint lithography or nano embossing technology. Mechanical properties such as shear modulus, retardation time and viscosity are experimentally evaluated for poly methyl methacrylate (PMMA) for various molecular weights (12k to 996k) over 100degreesC. Also, dependency on the shearing strain rate is evaluated using WLF law. Based on the results, process conditions are discussed for nano imprint lithography and experimentally demonstrated high aspect ratio pattern.

引用

页码：615 / 620

页数：6

共 6 条

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BOWER D, 2002, INTRO POLYM PHYSICS

[2]

CHOU S, 1997, J VAC SCI TECHNOL B, V14, P2897

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