The influence of atomic structure on the formation of electrical barriers at grain boundaries in SrTiO3

被引:92
作者
Browning, ND [1 ]
Buban, JP
Moltaji, HO
Pennycook, SJ
Duscher, G
Johnson, KD
Rodrigues, RP
Dravid, VP
机构
[1] Univ Illinois, Dept Phys, Chicago, IL 60607 USA
[2] Oak Ridge Natl Lab, Div Solid State, Oak Ridge, TN 37831 USA
[3] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
关键词
D O I
10.1063/1.123922
中图分类号
O59 [应用物理学];
学科分类号
摘要
An experimental atomic resolution analysis of an undoped Sigma 5 36 degrees [001] tilt grain boundary in SrTiO3 shows that the structure contains incomplete oxygen octahedra. These incomplete octahedra act as effective oxygen vacancies and lead to a fixed, positive boundary charge. Annealing the boundary in the presence of MnO2 does not change the atomic structure of the boundary plane, and results in a high concentration of Mn3+ (acceptor) enrichment at the specific Ti4+ locations in closest proximity to the effective oxygen vacancies. This result can be explained in terms of standard charge compensation models and indicates that the formation of electrical barriers at oxide grain boundaries may be influenced by the atomic structure of the boundary plane. (C) 1999 American Institute of Physics. [S0003-6951(99)00618-X].
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收藏
页码:2638 / 2640
页数:3
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