A study on structures and formation mechanisms of self-assembled monolayers of n-alkyltrichlorosilanes using infrared spectroscopy and atomic force microscopy

被引:45
作者
Iimura, K [1 ]
Nakajima, Y [1 ]
Kato, T [1 ]
机构
[1] Utsunomiya Univ, Fac Engn, Dept Appl Chem, Utsunomiya, Tochigi 3218585, Japan
关键词
atomic force microscopy (AFM); Fourier transform infrared spectroscopy (FTIR); monolayers; silane;
D O I
10.1016/S0040-6090(00)01544-3
中图分类号
T [工业技术];
学科分类号
08 [工学];
摘要
The structures and formation mechanisms of self-assembled monolayers of n-alkyltrichlorosilanes on glass substrates have been examined systematically using Fourier transform infrared spectroscopy (FTIR) and atomic force microscopy (AFM). The adsorption temperature dependency of FTIR frequencies and intensities of CH2 stretching vibration bands indicates the existence of a characteristic temperature, T-c, for each monolayer. The hydrocarbon chains observe an ordered and closely packed state when the monolayers are prepared below T-c, whilst disordered monolayers with low molecular density are formed above T-c. AFM observation clearly demonstrates an island-type growth of monolayers prepared below T-c. The results obtained contribute to an understanding of the growth behavior of the monolayers and the physical meaning of the T-c. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:230 / 239
页数:10
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