Electron beam irradiation of poly(vinyl methyl ether) films:: 1.: Synthesis and film topography

被引:18
作者
Hegewald, J
Schmidt, T
Gohs, U
Günther, M
Reichelt, R
Stiller, B
Arndt, KF
机构
[1] Tech Univ Dresden, Inst Phys Chem & Elektrochem, D-01062 Dresden, Germany
[2] Fraunhofer Inst Elektronenstrahl & Plasmatech, D-01277 Dresden, Germany
[3] Tech Univ Dresden, Inst Festkorperelektron, D-01062 Dresden, Germany
[4] Univ Munster, Inst Med Phys & Biophys, D-48149 Munster, Germany
[5] Univ Potsdam, Inst Phys, D-14469 Potsdam, Germany
关键词
D O I
10.1021/la0502589
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Temperature-sensitive hydrogel layers on silicon (Si) substrates were synthesized by electron beam irradiation of spin-coated poly(vinyl methyl ether) (PVME) films. The influences of the used solvent, the polymer concentration, and the spinning velocity on the homogeneity and the thickness of the PVME film were investigated. In the range of concentration c(p) = 1-15 wt% PVME in ethanol solution, homogeneous films with a thickness between d = 50 nm and 1.7 mu m were obtained. The films were cross-linked by electron beam irradiation under inert atmosphere and analyzed by sol-gel-analysis. The results were compared with bulkgels formed by electron beam irradiation of PVME in the dry state. The film topography was analyzed by high-resolution field emission scanning electron microscopy and atomic force microscopy. An islandlike structure in the dry, swollen, and shrunken state of the hydrogel films was observed.
引用
收藏
页码:6073 / 6080
页数:8
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