Very low chemical disorder in epitaxial NiMnSb films on GaAs(111)B

被引:36
作者
Van Roy, W
Wójcik, M
Jedryka, E
Nadolski, S
Jalabert, D
Brijs, B
Borghs, G
De Boeck, J
机构
[1] IMEC, B-3001 Louvain, Belgium
[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
[3] CEA Grenoble, SP2M, Dept Rech Fondamentale Mat Condensee, F-38054 Grenoble 9, France
关键词
D O I
10.1063/1.1627938
中图分类号
O59 [应用物理学];
学科分类号
摘要
Single-crystalline NiMnSb(111) films with negligibly low defect levels have been grown epitaxially on GaAs(111)B using molecular beam epitaxy and characterized by nuclear magnetic resonance. In a film with only 1% deviation from stoichiometry, 1.1% of all Mn atoms is involved in planar defects, similar to0.5% of all Sb sites is occupied by As-Sb substitutional atoms, and similar to0.2% of all Sb atoms has a modified environment. Both the average concentration of defects and the interface orientation are compatible with maintaining a half-metallic band structure at the ferromagnet/semiconductor interface, making these films a good candidate for spin injection into a semiconductor. (C) 2003 American Institute of Physics.
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页码:4214 / 4216
页数:3
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