Change in the oxidation state of the adsorbed oxygen equilibrated at 25°C on ZnO surface during room temperature annealing after rapid quenching

被引:21
作者
Fujitsu, S
Koumoto, K
Yanagida, H
Watanabe, Y
Kawazoe, H
机构
[1] Shonan Inst Technol, Dept Mat Sci & Ceram Technol, Kanagawa 2518511, Japan
[2] Nagoya Univ, Sch Engn, Dept Appl Chem, Chikusa Ku, Aichi 4648603, Japan
[3] Japan Fine Ceram Ctr, Atsuta Ku, Aichi 4568587, Japan
[4] Sci Univ Tokyo, Fac Ind Sci & Technol, Dept Mat Sci & Technol, Chiba 2788510, Japan
[5] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Kanagawa 2268503, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 3A期
关键词
ZnO; semiconductor; non-ohmic; ESR; oxidation state; surface;
D O I
10.1143/JJAP.38.1534
中图分类号
O59 [应用物理学];
学科分类号
摘要
The porous ZnO quenched from 500 degrees C in air showed very low electrical resistance with non-ohmic current-voltage behavior. This characteristic was resulted from the surface energy barrier formed by negatively charged chemisorbed oxygen. re resistance and the non-ohmic exponent of the quenched specimen gradually decreased by holding the specimen at room temperature. Electron spin resonance measurements showed a change in the oxidation state of chemisorbed oxygen from its high temperature type, O2-, into low temperature types, O-2(-) and O- while being kept at room temperature. From this viewpoint, it was judged that the decrease in the resistance and the non-ohmic exponent resulted from the release of the trapped electron by this change in the oxidation state. The resistance and the non-ohmic exponent of the sample doped with CoO were higher than those of the undoped sample, and their decrease for the CoO-doped sample while being-kept at room temperature was slower than those for the undoped sample. The rate of change in the oxidation state was also:slower in the CoO doped sample.
引用
收藏
页码:1534 / 1538
页数:5
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