Excimer laser ablation of Y-SiAlON

被引：10

作者：

Laude, LD ^{[1
]}

Ogeret, C ^{[1
]}

Jadin, A ^{[1
]}

Kolev, K ^{[1
]}

机构：

[1] Univ Mons, B-7000 Mons, Belgium

来源：

APPLIED SURFACE SCIENCE | 1998年 / 127卷

关键词：

ceramics; sialon; excimer laser; ablation;

D O I：

10.1016/S0169-4332(97)00754-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Materials processing with an excimer laser source attracts much attention as a very simple method for microfabrication and machining, specially in the case of hard ceramic composites. The present work focuses on KrF-excimer laser irradiation of yttrium-stabilized, sintered Si-Al-O-N, known as sialon. Low angle X-ray diffraction, energy dispersive X-ray analysis, Auger electron spectroscopy and surface profilometry are exploited at various stages of the lasts irradiation procedure in order to delineate the different steps of the sialon photochemical decomposition and ablation. (C) 1998 Elsevier Science B.V.

引用

页码：848 / 851

页数：4