Effect of atomic steps on the magnetic anisotropy in vicinal Co/Cu(001)

被引：97

作者：

Kawakami, RK ^{[1
]}

Bowen, MO ^{[1
]}

Choi, HJ ^{[1
]}

Escorcia-Aparicio, EJ ^{[1
]}

Qiu, ZQ ^{[1
]}

机构：

[1] Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA

来源：

PHYSICAL REVIEW B | 1998年 / 58卷 / 10期

关键词：

D O I：

10.1103/PhysRevB.58.R5924

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The step-induced uniaxial magnetic anisotropy of fcc Co films grown on a curved Cu(001) substrate was investigated in the vicinal angle range of 0 degrees to 6 degrees. The anisotropy strength was found to depend linearly on the step density, indicating that biaxial strain due to in-plane lattice misfit is not the origin of the step-induced anisotropy. By performing Cu adsorption experiments, we found that the magnetization easy axis switches by 90 degrees when the Co steps are decorated with similar to 1 atomic row of Cu per step, independent of the step density.

引用

页码：R5924 / R5927

页数：4

共 16 条

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