Interface stress and an apparent negative Poisson's ratio in Ag/Ni multilayers

被引:17
作者
Schweitz, KO [1 ]
Geisler, H [1 ]
Chevallier, J [1 ]
Bottiger, J [1 ]
Feidenhans, R [1 ]
机构
[1] Aarhus Univ, Inst Phys & Astron, DK-8000 Aarhus C, Denmark
来源
THIN-FILMS - STRESSES AND MECHANICAL PROPERTIES VII | 1998年 / 505卷
关键词
D O I
10.1557/PROC-505-559
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
By use of dc-magnetron sputtering, (111) textured Ag/Ni muitilayered thin films were deposited with nominal bilayer repeat lengths ranging from 2 nm to 250 nm. Bulk and interface stresses were obtained from X-ray diffraction and measurements of substrate curvatures. Both in-plane and out-of-plane expansions were observed in the Ni layers, and a compressive interface stress of -2.24+/-0.21 J/m(2) was found. This is in agreement with a previously published result of the interface stress in Ag/Ni thin films which had, as opposed to the present multilayers, a high level of total stress.
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页码:559 / 567
页数:3
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