Interface stress and an apparent negative Poisson's ratio in Ag/Ni multilayers

被引：18

作者：

Schweitz, KO ^{[1
]}

Geisler, H ^{[1
]}

Chevallier, J ^{[1
]}

Bottiger, J ^{[1
]}

Feidenhans, R ^{[1
]}

机构：

[1] Aarhus Univ, Inst Phys & Astron, DK-8000 Aarhus C, Denmark

来源：

THIN-FILMS - STRESSES AND MECHANICAL PROPERTIES VII | 1998年 / 505卷

关键词：

D O I：

10.1557/PROC-505-559

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

By use of dc-magnetron sputtering, (111) textured Ag/Ni muitilayered thin films were deposited with nominal bilayer repeat lengths ranging from 2 nm to 250 nm. Bulk and interface stresses were obtained from X-ray diffraction and measurements of substrate curvatures. Both in-plane and out-of-plane expansions were observed in the Ni layers, and a compressive interface stress of -2.24+/-0.21 J/m(2) was found. This is in agreement with a previously published result of the interface stress in Ag/Ni thin films which had, as opposed to the present multilayers, a high level of total stress.

引用

页码：559 / 567

页数：3