Self-assembly patterning of silica colloidal crystals

被引：80

作者：

Masuda, Y ^{[1
]}

Itoh, T ^{[1
]}

Koumoto, K ^{[1
]}

机构：

[1] Nagoya Univ, Grad Sch Engn, Koumoto Lab, Dept Appl Chem,Chikusa Ku, Nagoya, Aichi 4648603, Japan

来源：

LANGMUIR | 2005年 / 21卷 / 10期

关键词：

D O I：

10.1021/la050075m

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We developed a self-assembly process of silica particles to fabricate desired patterns of colloidal crystals having high feature edge acuity and high regularity. A micropattern of colloidal methanol prepared on a self-assembled monolayer in hexane was used as a mold for particle patterning, and slow dissolution of methanol into hexane caused shrinkage of molds to form micropatterns of close-packed SiO2 particle assemblies. This result is a step toward the realization of nano/micro periodic structures for next-generation photonic devices by a self-assembly process.

引用

页码：4478 / 4481

页数：4

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