A 100 kV 10 a high-voltage pulse generator for plasma immersion ion implantation

The design of a high-voltage pulsing system for a plasma immersion ion implantation (PIII) facility is presented. A list of requirements, which have to be fulfilled by a high-voltage pulse generator to get best results and a optimum operation of the PIII system, is given. A simple electrical model of the plasma is presented which describes the plasma as a capacitive-resistive load. The model parameters are determined to fit experimental results. The requirements for the pulse generator can be fulfilled well using a pulse generator design which employs a hard tube switch. A pulse generator design is presented which is especially optimized for PIII systems. The hard tube control is especially optimized for obtaining voltage rise times as short as possible. (C) 1996 American Institute of Physics.