Varied line-spacing plane grating monochromator for undulator beamline

被引：51

作者：

Fujisawa, M

Harasawa, A

Agui, A

Watanabe, M

Kakizaki, A

Shin, S

Ishii, T

Kita, T

Harada, T

Saitoh, Y

Suga, S

机构：

[1] HITACHI LTD,INSTRUMENT DIV,HITACHINAKA,IBARAKI 312,JAPAN

[2] TOKYO METROPOLITAN UNIV,FAC TECHNOL,DEPT PRECIS ENGN,HACHIOJI,TOKYO 19203,JAPAN

[3] OSAKA UNIV,FAC ENGN SCI,DEPT PHYS MAT,TOYONAKA,OSAKA 560,JAPAN

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1996年 / 67卷 / 02期

关键词：

D O I：

10.1063/1.1146621

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A varied line-spacing plane grating monochromator is installed at an undulator beamline BL-19B of the Photon Factory. Small contribution of aberrations to image sizes at a focal plane of the varied line-spacing plane grating is calculated with use of an optical path function. The largest resolving power obtained from a ray tracing is estimated to be 4600 at a photon energy of 1239.85 eV and 10 000 at 91.2 eV. Gas absorption spectra show the similar extent of resolution obtained by the ray tracing. A high brightness with a high resolution may be realized in this monochromator. (C) 1996 American Institute of Physics.

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收藏

页码：345 / 349

页数：5

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