Generation of electron beam probe in scanning electron microscopy

被引:3
作者
Lim, Sun-Jong [1 ]
Lee, Chang-Hong [1 ]
机构
[1] KIMM, Intelligent Mfg Syst Res Div, Seoul, South Korea
来源
2008 INTERNATIONAL CONFERENCE ON SMART MANUFACTURING APPLICATION | 2008年
关键词
scanning electron microscopy; electron beam; electron beam probe; electron gun; electron lens;
D O I
10.1109/ICSMA.2008.4505604
中图分类号
TP18 [人工智能理论];
学科分类号
081104 ; 0812 ; 0835 ; 1405 ;
摘要
The electron column consists of an electron gun, one object lens and two condenser lenses. The electron gun produces a source of electrons and accelerates these electrons to an energy in the range 1-30 keV. Electron lenses are used to reduce the diameter of this source of electrons and place a small, focused electron beam on the specimen. Electron probe refers to the focused electron beam at the specimen. In order to eventually construct an image, the beam must be moved from place to place by means of a scanning system. The beam electrons interact both elastically and inelastically with the specimen, forming the limiting interaction volume from which the various types of radiation emerge, including backscattered, secondary, absorbed electrons and x rays. By using suitable detectors, we make image signals. Image of SEM is dependent upon the beam parameters: electron-probe size, electron-probe-current and electron probe convergence angle. These three parameters cannot be selected independently because they are interrelated.
引用
收藏
页码:15 / 18
页数:4
相关论文
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[2]  
JOSEPH I, SCANNING ELECT MICRO, P43
[3]  
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[4]  
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