Growth of IrO2 films and nanorods by means of CVD:: An example of compositional and morphological control of nanostructures

The deposition of IrO2 thin films using the cold-wall chemical vapor deposition (CVD) method was discussed. It was shown that by optimizing experimental parameters, the formation of distinct, rod-like, aligned IrO 2 nanocrystals can be observed, with good control of growth perpendicular to the substrate surfaces. The structural composition, surface morphology, and spectroscopic properties of the resulting IrO2 materials were also described. It was demonstrated that the reactive mixture (CpMe)Ir(COD)/O2 was used in CVD experiments that were conducted under three different pressure settings, 1 torr, 10 torr and 30 torr.