Co ferrite films with excellent perpendicular magnetic anisotropy and high coercivity deposited at low temperature

被引:63
作者
Kitamoto, Y [1 ]
Kantake, S [1 ]
Shirasaki, F [1 ]
Abe, M [1 ]
Naoe, M [1 ]
机构
[1] Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
关键词
D O I
10.1063/1.370455
中图分类号
O59 [应用物理学];
学科分类号
摘要
The present article describes CoxFe3-xO4 films, which were fabricated at 90 degrees C by the ferrite-plating method and have the excellent perpendicular magnetic anisotropy and the perpendicular coercivity H-c perpendicular to above 2 kOe. The films were composed of Co ferrite and Fe3O4 grains. The highest H-c perpendicular to reached 3 kOe at the composition of Co0.43Fe2.57O4 and the saturation magnetization M-s was 500-550 emu/cc. H-c perpendicular to was over 2 kOe even for a film thickness of 35 nm without any underlayers. Delta M-perpendicular to evaluation that is measured in the perpendicular direction to the film plane showed that the interactions in the films supported the magnetized state, stabilizing the direct current remanent state. The Mossbauer analyses revealed that the Co0.43Fe2.57O4 films have excellent perpendicular magnetic anisotropy and the magnetization direction inclined from the perpendicular axis due to the demagnetization field. This achievement will open the way to develop the high-density perpendicular recording media even when plastic disks and sheets are used as substrates. (C) 1999 American Institute of Physics. [S0021-8979(99)51808-2].
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页码:4708 / 4710
页数:3
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